TOKYO--(BUSINESS WIRE)--Advantest Corporation (TSE: 6857)(NYSE: ATE) today announced that it has developed a new mask defect review tool, the Mask DR-SEM E5610, for reviewing and classifying ...

System reliability and safety are paramount across industries such as semiconductors, energy, automotive, and steel, where even microscopic cracks or defects within structures can critically affect ...

Figure 1: In situ SEM bending test of an individual ZnO nanowire. Figure 2: Recovery and damping behaviours of a ZnO nanowire. It should be noted that our theoretical model is more general than the ...

As design rules shrink to 45-nm and smaller, defect and yield engineers are becoming increasingly concerned about the quality of the defect frequency data coming from their review tools. To allow ...

One of the most important aspects of manufacturing of semiconductor devices is consistent and efficient inspection. This can lead to increased yields and thus increased profitability. The product and ...

The E5610 inherits the highly stable, fully automatic image capture technology developed by Advantest for its acclaimed multi vision metrology SEM for photomasks, and features a newly developed beam ...